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This research demonstrates high-resolution nanolithography and dry etching using N-doped materials, suggesting advancements in imaging techniques.
Direct laser writing lithography provides a maskless and cost-effective approach to nanofabrication, yet its resolution is fundamentally limited by optical diffraction. This work demonstrates sub-diffraction-limit nanolithography and dry etching using...
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Guo et al. (2026) studied this question.
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