Synthesis of heteroleptic Sr(ddemap)(tmhd) 2 and its use in atomic layer deposition of low carbon SrO thin films

Key Points

• The aim is to synthesize and evaluate heteroleptic Sr complexes as precursors for atomic layer deposition.
• Synthesis of heteroleptic [Sr(ddemap)(tmhd)] 2 complexes
• Evaluation as ALD precursors for SrO growth
• Use of O3 in the deposition process
• Self-limited growth of SrO films achieved at 370 °C
• Al2O3 capping prevented carbonate formation
• Smooth and high-purity SrO films produced