This research demonstrates a new precursor for SrO thin films in atomic layer deposition, suggesting effective film formation techniques.
New heteroleptic Sr complexes were synthesized and evaluated as ALD precursors. [Sr(ddemap)(tmhd)] 2 enabled self-limited SrO growth at 370 °C with O 3 . Al 2 O 3 capping effectively suppressed carbonate formation, yielding smooth, high-purity SrO films.
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Lee et al. (2026) studied this question.
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