ABSTRACT Edge dislocations effectively scatter phonons, leading to exceptionally low lattice thermal conductivity ( κ lat ) and thus invoke extensive research toward enhancing thermoelectric performance. However, it also severely reduces carrier mobility ( µ H ), which ultimately limits overall thermoelectric efficiency. Herein, we build a unified framework that elucidates the impact of dislocations on electronic and thermal transport. We reveal that the charged space surrounding dislocations suppresses µ H through carrier trapping and scattering. This insight offers a new degree of freedom to design thermoelectric materials by utilizing the electrostatic environment near dislocations. By directly mapping µ H , κ lat , and the thermoelectric figure of merit (ZT) against dislocation density ( N dis ) and carrier concentration ( n H ) in n‐type PbSe, we predict a maximum ZT ∼1.28 at N dis ∼3.2 × 10 11 cm −2 and n H ∼2.9 × 10 19 cm −3 . Experimentally, Cu 0.004 Pb 0.9 Ge 0.05 Sb 0.033 Se with N dis ∼5 × 10 11 cm −2 conforms well to the theoretical prediction, achieving a ZT of ∼1.3 at 773 K and surpasses previously reported values for PbSe embedded with dislocations. This work advances dislocation engineering from empirical trial‐and‐error toward a predictive strategy for designing high‐performance thermoelectric materials.
Han et al. (2026) studied this question.