In situ X-ray diffraction investigation of NiS x -formation on Ni-foam using chemical vapor deposition with H ₂ S

Soffi E. S. Olesen; Magnus Kløve; Anders Bæk Borup; Andreas Dueholm Bertelsen; Marcus V. Kragh-Schwarz; Thorbjørn Erik Køppen Christensen; Frederik Holm Gjørup; Mads Ry Vogel Jørgensen; Jacopo Catalano; Anders W. Jensen; Bo Brummerstedt Iversen

doi:10.1039/d5sc08479b

January 1, 2026Chemical ScienceOpen Access

In situ X-ray diffraction investigation of NiS x -formation on Ni-foam using chemical vapor deposition with H ₂ S

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Key Points

The aim is to investigate the formation mechanism of NiS on nickel foam using in situ techniques.
Applied chemical vapor deposition (CVD) with H₂S on nickel foam.
Utilized in situ X-ray diffraction to monitor formation processes.
Demonstrated effective NiS formation on nickel foam.
Identified potential applications in supercapacitors and alkaline water electrolysis.

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Implication

In situ investigation reveals NiS formation in nickel foam via chemical vapor deposition, suggesting enhanced energy applications.

Abstract

Nickel foam treated via chemical vapor deposition (CVD) with H₂S has demonstrated potential in applications such as supercapacitors and catalysis for alkaline water electrolysis. However, the formation mechanism of the...

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Olesen et al. (2026) studied this question.

synapsesocial.com/papers/698433a5f1d9ada3c1fb100f https://doi.org/10.1039/d5sc08479b

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In situ X-ray diffraction investigation of NiS x -formation on Ni-foam using chemical vapor deposition with H ₂ S

Key Points

Ask about this paper

Implication

Abstract

Discussion

Cite This Study

In situ X-ray diffraction investigation of NiS x -formation on Ni-foam using chemical vapor deposition with H ₂ S

Key Points

Ask about this paper

Implication

Abstract

Discussion

Cite This Study

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