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February 28, 2026npj Microgravity0 citationsOpen Access

Microgravity-enabled growth of uniform InAsSb bulk single crystal

JHJidong HuangChinese Academy of SciencesHZHuaiwen ZhengYZYin ZhigangInstitute of Semiconductors

Key Points

  • The study aims to achieve uniform growth of InAsSb bulk crystals in microgravity conditions to improve crystallinity and electrical properties.
  • Utilized vertical gradient freeze method
  • Grew InAs0.933Sb0.067 alloy on InAs seed
  • Conducted experiments aboard the China Space Station
  • Achieved a uniform single crystal with ~11 mm diameter and ~2.5 mm growth length
  • Reduced dislocation density by tenfold compared to terrestrial samples
  • Maintained Sb compositional uniformity within ±0.5 mol%
  • Demonstrated superior electrical properties compared to ground-grown crystals

Abstract

The growth of compositionally uniform InAs1-xSbx bulk crystals remains a formidable challenge due to severe solute segregation and morphological instability under terrestrial conditions. Here, we report the successful growth of a single-crystalline InAs0.933Sb0.067 alloy (x = 6.7 mol%) on an InAs seed via the vertical gradient freeze method aboard the China Space Station. Crucially, microgravity enables diffusion-dominated solidification by suppressing buoyancy-driven convection. As a direct consequence, the crystal is free of macroscopic voids and striations, exhibits a tenfold reduction in dislocation density, and maintains Sb compositional uniformity (±0.5 mol%) over its entire ~11 mm diameter and ~2.5 mm growth length. Moreover, the microgravity-grown crystal outperforms its terrestrial counterpart in both crystalline quality and electrical properties. These findings highlight that microgravity provides a unique pathway to overcome the intrinsic limitations of ground-based growth, enabling crystal quality unattainable on Earth — with potential relevance to advanced optoelectronic applications.

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Cite This Study

Huang et al. (2026) studied this question.

synapsesocial.com/papers/69a286240a974eb0d3c00e1dhttps://doi.org/10.1038/s41526-026-00581-5
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