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February 28, 2026JETP Letters0 citationsOpen Access

VLS Grating for X-Ray Optics as Fabricated by e-beam Nanolithography with Optically Confirmed Exponential Line-density Variation

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AAA. I. ArzhanovVSV. V. ShulgaASA. S. Shelkovnikov

Key Points

  • To develop a large-area Varied Line-Space grating for X-ray optics with controlled line density variations.
  • Utilized e-beam lithography for fabrication
  • Achieved exponential line density variation on the grating
  • Conducted optical measurements to confirm design accuracy
  • Fabricated grating exhibited line densities from 160 to 560 mm–1
  • First-order operating spectral range achieved was 9–20 nm
  • Optical measurements confirmed the alignment of actual and intended line density

Abstract

We report the development of a large-area plane Varied Line-Space grating with line density varying exponentially along the grating surface roughly from 160 to 560 mm –1 . The grating was produced using e-beam lithography with original square-stamp beam profile and is intended for an innovative high-resolution single-component grazing-incidence monochromator, in which wavelength scanning is achieved simply by linear movement of the grating along its surface. For a grating width of 60 mm, the first-order operating spectral range is 9–20 nm. Optical measurements of the line density-vs-coordinate dependence reveal perfect match between the fabricated and intended by the design density dependences.

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Cite This Study

Arzhanov et al. (2026) studied this question.

synapsesocial.com/papers/69a286370a974eb0d3c00fbehttps://doi.org/10.1134/s0021364026600321
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