Synthesis and characterization of DC plasma-sputtered semiconductor oxide photoanodes to boost the photoelectro-Fenton removal of atrazine from sewage wastewater

Key Points

• Enhanced photoelectro-Fenton process achieves greater atrazine removal.
• Results show a 50% increase in efficiency with optimized semiconductor photoanodes.
• Synthesis utilized direct current plasma-sputtering to develop novel photoanodes for wastewater treatment.
• Supports further exploration of plasma technology in environmental applications.