March 3, 2026Materials Research Express0 citationsOpen Access

PVD magnetron sputtering for coating thickness reference materials: a comprehensive review (1974–2025)

ADArmando Domínguez-GarcíaAutonomous University of Chihuahua FMF. Mercader-TrejoPolytechnic University of Queretaro GMGuillermo C. Mondragon-RodriguezCenter for Engineering and Industrial Development

Key Points

PVD-MS has evolved significantly, addressing both precision and versatility in manufacturing coatings over 50 years.
Key advancements include AI integration, enhancing homogeneity and stability of thin coatings up to 2025.
This review analyzes the effectiveness of PVD-MS compared to CVD and ALD methods, noting its unique advantages.
Challenges remain in defect control and incorporating surface roughness in uncertainty assessments.

Abstract

Abstract This review summarizes the evolution of magnetron sputter physical vapor deposition (PVD-MS) for manufacturing thin-coating Reference Materials (RMs) over the past 5 decades. It discusses progress from fundamental models like Thornton’s Zone Diagram to modern innovations such as HiPIMS and the integration of artificial intelligence (AI). It assesses improvements in homogeneity and stability and compares PVD-MS with other methods (CVD, ALD, and ECD). It highlights its balance between precision, versatility, and scalability. It also discusses current challenges, such as defect control and the need to include surface roughness in uncertainty calculations. The article concludes that PVD-MS, especially with the support of AI, is an indispensable technology for future certified thickness standards.

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