Demonstrates efficient beam dynamics in a plasma accelerator, suggesting improved injection schemes for high-quality electron beams.
In this paper we present a new scheme of injection into a plasma accelerator, aimed at producing a high quality beam while relaxing the demands on the bunch length of the injected beam. The beam dynamics in the injector, consisting of a high voltage pulsed photo-diode, is analyzed and optimized to produce a lambdaₚ /20 long electron bunch at 2.5 MeV. This bunch is injected into a plasma wave in which it compresses down to lambdaₚ /100 while simultaneously accelerating up to 250 MeV. This simultaneous bunching and acceleration of a high quality beam requires a proper combination of injection energy and injection phase. Preliminary results from simulations are shown to assess the potentials of the scheme.
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M et al. (2000) studied this question.
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