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March 5, 20260 citationsOpen Access

Conceptual Design of a Synchrotron Radiation Source Dedicated to X-Ray Lithography

BMBassetti M.BEBernieri E.BEBurattini E

Key Points

  • The aim is to design an effective synchrotron radiation source for specialized X-ray lithography applications.
  • Optimized parameters based on lithography requirements
  • Analyzed radiation spectrum and beam source sizes
  • Considered machine performance aspects such as lifetime and stability
  • Proposed high-field conventional magnets for radiation production
  • Achieved design conditions for reliable operation at target current
  • Addressed issues of beam instabilities effectively
  • Ensured long operational lifetime of the source

Abstract

The design of a synchrotron radiation source dedicated to X-ray lithography is presented. The parameter optimization carried out is based on the lithography requirements, on the radiation spectrum and beam source sizes, and on the machine performances, such as long lifetime, absence of beam instabilities and reliable operation at design current. High-field conventional magnets are proposed for the radiation production

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Cite This Study

M. et al. (1992) studied this question.

synapsesocial.com/papers/69a91e57d6127c7a504c24bbhttps://doi.org/10.15161/oar.it/eam6y-ds964
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