Conceptual design reveals optimized synchrotron source performance for X-ray lithography, indicating efficient radiation production.
The design of a synchrotron radiation source dedicated to X-ray lithography is presented. The parameter optimization carried out is based on the lithography requirements, on the radiation spectrum and beam source sizes, and on the machine performances, such as long lifetime, absence of beam instabilities and reliable operation at design current. High-field conventional magnets are proposed for the radiation production
No takes yet. Share an insight, caveat, or question.
M. et al. (1992) studied this question.
Synapse has enriched 5 closely related papers on similar clinical questions. Consider them for comparative context: