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March 6, 2026Journal of Materials Chemistry C3 citations

Recent advances in design and preparation of abrasives for chemical mechanical polishing of hard-brittle materials

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QMQing MaXNXinhuan NiuJZJiakai Zhou

Key Points

  • The aim is to explore recent advancements in abrasive design and their impact on chemical mechanical polishing of hard-brittle materials.
  • Review existing literature on CMP abrasives.
  • Analyze properties and removal mechanisms of abrasives.
  • Discuss optimization strategies for balancing removal rate and surface quality.
  • Identified key properties that enhance abrasive performance.
  • Outlined challenges in achieving optimal surface quality.
  • Highlighted future directions for research and development in CMP abrasives.

Abstract

This review summarizes CMP abrasive design, properties, removal mechanisms, optimization, applications, challenges, and future directions for balancing removal rate and surface quality in ultra-precise processing of hard-brittle materials.

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Cite This Study

Ma et al. (2026) studied this question.

synapsesocial.com/papers/69aa7160531e4c4a9ff5b7b1https://doi.org/10.1039/d5tc04531b
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