MOCVD Growth of Next-Generation III–V Semiconductor Devices: In Review

Metal–organic chemical vapor deposition (MOCVD) is a crystal growth technique used to achieve high-purity thin films, especially III–V materials, for fabricating semiconductor devices. It allows for thickness tunability, controlled doping, and composition of epilayers. This review focuses on the principle of MOCVD, its historical background, and its applications in III–V semiconductor devices such as solar cells, high electron mobility transistors (HEMTs), light-emitting diodes (LEDs), laser diodes (LDs), and photonic integrated circuits (PICs). This review highlights the recent developments in MOCVD aimed at improving its efficiency, performance, and sustainability. Finally, we emphasize emerging trends and challenges in MOCVD process innovation, reactor design, and material integration that are poised to drive the development of next-generation optoelectronic, photonic, and quantum technologies. Together, these findings underscore MOCVD’s pivotal role in enabling high-performance devices and sustaining leadership in post-Moore semiconductor technologies.