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This analysis demonstrates the growth of titanium oxide films in a low-pressure reactor, suggesting various co-reactants affect film composition and texture.
ClTi(OiPr)₃ reacts with Na[HB(R³R⁴R⁵pz)₃] (where pz denotes pyrazolyl) to yield volatile isopropoxy(pyrazolylborate)titanium(IV) compounds. Methoxy- and tert-butoxy(pyrazolylborate)titanium(IV) complexes were isolated from the reaction of hydrido(trispyrazolylborate)trichlorotitanate with the sodium alcoholate. Using [HB(pz)₃Ti(OiPr)₃], thin amorphous TiO₂ films were grown by metal organic chemical vapor deposition (MOCVD) in a low pressure reactor, in the temperature range 250-600 °C. The dependence of the growth on evaporation rate, oxygen flow, and substrate temperature is discussed. The influence of different co-reactants on texture and composition of the film, i.e., O₂, N₂, H₂, and O₂ with MeOH, was also investigated. The films were characterized by UV-vis and IR spectroscopy, X-ray diffraction (XRD), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS).
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Plappert et al. (1999) studied this question.
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