A brief description of lithographic capabilities is given at use of various radiation sources and approaches to the applying graphic drawings process organizing in the form of projection and scanning lithography. The main difficulty in implementing the creation of nanosized X-ray scanning lithography associated with the formation of nanosized X-ray beams of the required intensity is indicated, and an approach to overcoming it by using an X-ray waveguide resonance device of a special design is pointed. Experimental data characterizing the X-ray beam generated by this device are presented.
Egorov et al. (Mon,) studied this question.