This research demonstrates the effectiveness of a modified photopolymer material for recording microstructures, suggesting advancements in material applications.
A hybrid acrylate-thiol-siloxane photopolymer material was modified with an aminosiloxane oligomer. The aminosiloxane oligomer was synthesized via non-hydrolytic condensation of diphenylsilanediol and (N,N-dimethylaminopropyl)trimethoxysilane and characterized by 1H NMR, 29Si NMR spectro-scopy, and MALDI-TOF mass spectrometry. The aminosiloxane oligomer was shown to be stable against spontaneous hydrolytic condensation during storage. Modification of the hybrid photopolymer material with the aminosiloxane oligomer resulted in the formation of transparent films at an ambient humidity of 60%. For photocured films obtained from structural blocks of different quantitative compositions, the values of the elastic modulus (0.66–1.24 GPa) and glass transition temperature (47–70°C) were determined. High-aspect-ratio microstructures were successfully recorded using synchrotron radiation based on the modified material.
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Aliev et al. (2025) studied this question.
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