Demonstrates improved tracking accuracy in nanoscale imaging through a novel control strategy, suggesting significant enhancements for defect detection.
In nanoscale wafer defect inspection, raster scan imaging imposes sub-micrometer requirements on motion stage tracking accuracy, while trajectory changes and load variations pose significant challenges to traditional control methods. This paper proposes a Real-time Iterative Compensation based Adaptive Robust Control (RICARC) strategy. Within this framework, the ARC module incorporates RLS-based online parameter estimation, a PID-type feedback control term, and a robust control term to suppress lumped disturbances. On this basis, the RIC module establishes a discrete prediction model based on the ARC closed-loop system and iteratively generates optimal feedforward compensation signals at each sampling instant to further suppress residual tracking errors. Experimental results across five operating scenarios, including periodic, dual-frequency, and S-curve trajectories, as well as payload variation, and strong external disturbances, demonstrate that RICARC consistently achieves sub-micrometer RMS accuracy ranging from 0.120 to 0.240 μm, reducing RMS errors by over 75% compared with conventional ARC, effectively enhancing imaging quality in nanoscale wafer defect detection systems.
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Guo et al. (2026) studied this question.
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