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March 7, 2022Advanced Materials

Reducing Contact Resistance and Boosting Device Performance of Monolayer MoS2 by In Situ Fe Doping

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Authors

HLHui LiWuhan UniversityMCMo ChengMaterials Science & EngineeringPWPeng WangBGI Group (China)

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Li et al. (2022) studied this question.

synapsesocial.com/papers/69d914bd9a6164e50fa3bfb0https://doi.org/10.1002/adma.202200885
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