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Although extensive studies on hydrogen (H) retention in tungsten (W) loaded by ion implantation, plasma exposure and gas charging have been done, reported amounts of H retained in W, and their dependences on the incident flux, fluence and temperature are very inconsistent. The present work aims at the clarification of the H retention mechanisms with critical review of reported data and presentation of recent results. H diffusion coefficient for dissolved H in W is large enough to allow for a deep penetration of H into W bulk. Energetic H loading results in H saturation in the subsurface layers. The thickness of the saturated layers could grow under prolonged loading and the H in the layers remain long or hard to remove. Both the growth of the thickness of the saturated layers and the deep penetration of H into the bulk could result in significantly large H retention in W and dissipate the advantage of W as plasma facing wall.
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T. Tanabe (2014) studied this question.
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