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Abstract This review article discusses progress in surface plasmon resonance (SPR) of two‐dimensional (2D) and three‐dimensional (3D) chip‐based nanostructure array patterns. Recent advancements in fabrication techniques for nano‐arrays have endowed researchers with tools to explore a material’s plasmonic optical properties. In this review, fabrication techniques including electron‐beam lithography, focused‐ion lithography, dip‐pen lithography, laser interference lithography, nanosphere lithography, nanoimprint lithography, and anodic aluminum oxide (AAO) template‐based lithography are introduced and discussed. Nano‐arrays have gained increased attention because of their optical property dependency (light‐matter interactions) on size, shape, and periodicity. In particular, nano‐array architectures can be tailored to produce and tune plasmonic modes such as localized surface plasmon resonance (LSPR), surface plasmon polariton (SPP), extraordinary transmission, surface lattice resonance (SLR), Fano resonance, plasmonic whispering‐gallery modes (WGMs), and plasmonic gap mode. Thus, light management (absorption, scattering, transmission, and guided wave propagation), as well as electromagnetic (EM) field enhancement, can be controlled by rational design and fabrication of plasmonic nano‐arrays. Because of their optical properties, these plasmonic modes can be utilized for designing plasmonic sensors and surface‐enhanced Raman scattering (SERS) sensors.
Kasani et al. (Fri,) studied this question.