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A short overview is presented of the growth of surface analysis and, in particular, of X-ray photoelectron spectroscopy (XPS) during the past 25 years. Information is given on some of the National Institute of Standards and Technology (NIST) databases that have been developed for applications in XPS and Auger-electron spectroscopy (AES) and that have helped enable this growth. Information is also provided on three XPS-modeling products that help users obtain quantitative information for an increasing range of complex materials.
C. J. Powell (Tue,) studied this question.