We developed the novel positive photosensitive polyimide coatings "PW-1000". The coatings have alkaline developablity as well as fine resolution. The coatings have wide focus margin also. In addition to these photolithographic performances, the "PW-1000" has good heat stability, solution stability, and plasma etching resistance. These features promise that "PW-1000" is suitable for the LSI application.
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Tomikawa et al. (2000) studied this question.
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