Influence of Si Content on the Microstructure and Properties of Hydrogenated Amorphous Carbon Films Deposited by Magnetron Sputtering Technique

Hydrogenated amorphous carbon (a-C:H) films are widely valued for their excellent mechanical strength and low friction, but their performance significantly degrades at elevated temperatures, limiting practical applications in aerospace environments. In this work, we aimed to enhance the high-temperature tribological behavior of a-C:H films through controlled silicon (Si) doping. A series of a-C:H:Si films with varying Si contents were fabricated via direct current magnetron sputtering, and their microstructure, mechanical properties, and friction behavior were systematically evaluated from room temperature up to 400 °C. Results show that moderate Si doping (8.3 at.%) substantially enhances hardness and wear resistance, while enabling ultralow friction (as low as 0.0034) at 400 °C. This superior performance is attributed to the synergistic effects of transfer layer formation, preferential Si oxidation, and tribo-induced graphitization. This study provides new insights into the high-temperature lubrication mechanisms of Si-doped a-C:H films and demonstrates the critical role of Si content optimization, highlighting a viable strategy for extending the thermal stability and lifespan of solid-lubricating films.