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December 3, 2018Advanced Materials Interfaces

Impact of Post‐Lithography Polymer Residue on the Electrical Characteristics of MoS2 and WSe2 Field Effect Transistors

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JLJierui LiangUniversity of MinnesotaKXKe XuRochester Institute of TechnologyBTBlaec TonciniUniversity of Pittsburgh

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Liang et al. (2018) studied this question.

synapsesocial.com/papers/69df0d13d5404a0bea591a9dhttps://doi.org/10.1002/admi.201801321
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