Direct patterning of self-assembled nanocrystal monolayers by electron beams

We demonstrate a method for laterally patterning metal nanocrystal monolayers. Extended monolayers are first self-assembled onto a solid substrate. Direct electron-beam exposure is then used to strip the dodecanethiol ligand coating from the nanocrystal cores, enabling the cores to stick to the underlying substrate. During a subsequent washing step in a solvent mixture, nanocrystals from the unexposed regions are removed and floated off, leaving behind the desired pattern.