Evaluation of the Thermodynamic Data of CH3SiCl3 Based on Quantum Chemistry Calculations

C H 3 Si Cl 3 (methyltrichlorosilane) (MTS) is one of the most important precursors for manufacturing both an oxidation resistant SiC coating and a functional SiC film by chemical vapor deposition (CVD). In order to analyze the decomposition products of MTS with a thermodynamic calculation, correct thermodynamic data must be obtained from the authoritative data sources. G3(MP2) has been applied to evaluate the thermodynamic data of MTS(gas). The calculated value of the Gibbs energy of formation, ΔfGm0(298.15K)=−490.13kJ∙mol−1, compares with a value, ΔfGm0(298.15K)=−468.02kJ∙mol−1 from the 4th edition of the NIST-JANAF Thermochemical Tables. Further analyses have been conducted: (1) by using G3, G3//B3LYP, and G3(MP2)//B3LYP theories; (2) by using variable scale factors for G3(MP2) theory; and (3) by investigating the accuracy of both experimental and calculated thermodynamic data. The calculated values can provide ΔfGm0 values for MTS above 1500K. The final fitted equation for MTS(gas) is: ΔfGm0=7.5763×10−6T2+1.9649×10−1T−5.4817×102, where T is absolute temperature.