The vacuum degree in the cavity of the electron beam evaporation coating equipment and the time taken to reach the vacuum are the key factors to measure the quality of the equipment. The shutter structure in the exhaust pipe can prevent the discharge of metal vapor molecules, but it will also hinder the discharge of air during vacuum. In order to improve the pumping performance of the equipment, a finite element simulation model was established based on comsol multiphysics simulation software. In this paper, this model is applied to investigate the influence of the louver blade structure in the pumping pipeline on the system’s performance. A parametric study was conducted by simulating the vacuuming process under different angles and quantities of blades. The results show that the larger the angle of the blades and the fewer the number of blades, the higher the efficiency of air extraction. Vacuum experiments were conducted using a high-precision multilayer metal evaporation semiconductor equipment to verify the accuracy of the simulation model. This study makes the vacuuming process of semiconductor equipment clearer and provides data support for the design and selection of the louver blades in the pipelines of evaporation coating equipment.
Yuan et al. (Thu,) studied this question.