Demonstrates enhanced interfacial bonding in copper/aluminum composites, suggesting a novel treatment method.
Traditional homogenization surface treatment overlooks the morphological mechanical matching requirements between hard and soft metals, thereby limiting the potential for interfacial synergy in laminated composites. This study proposes a differentiated surface pretreatment strategy. Sharp periodic grooves are constructed on the hard side, while a relatively smooth surface is maintained on the soft side. This structure, characterized as a hard tooth/soft matrix interface, achieves synergistic enhancement of interfacial properties. Copper and aluminum were used as model materials. Periodic grooves with a maximum profile height ( R t ) of 28.4 μm were fabricated on the copper side, and a smooth surface with an R t of 7.9 μm was prepared on the aluminum side. This combination yielded an interfacial bonding strength of 83.5 MPa, which is 21.89% to 39.63% higher than that of uniformly treated combinations. Furthermore, this configuration achieved the highest interfacial hardness gradient (54.1 HV) and the widest interdiffusion layer (~4.46 μm). The thickness of the interdiffusion layer increased by 7.99% to 17.06% compared to uniform treatments. Localized severe plastic deformation, induced by the enhanced mechanical interlocking from the hard tooth/soft matrix structure, led to the formation of a grain refinement layer near the interface. Grain sizes were refined from ~30 μm in the matrix to less than 2 μm, accompanied by the accumulation of high-density dislocations. These defect-rich regions served as “short-circuit” paths for atomic diffusion, significantly accelerating atomic migration. This study provides a new approach and paradigm for precisely controlling the interface structure of composites through material property-based differentiated surface morphology design. • Differential pretreatment creates "hard-tooth/soft-matrix" interface for Cu/Al composites. • Optimal combination achieves 83.5 MPa bonding strength, 21.9-39.6% higher than uniform treatments. • Mechanical interlock-induced defects serve as short-circuit paths for atomic diffusion.
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