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July 1, 1974Journal of Applied Physics3,713 citations

Deep-level transient spectroscopy: A new method to characterize traps in semiconductors

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DLD. V. Lang

Key Points

  • This research aims to introduce and characterize a new technique for detecting traps in semiconductors using deep-level transient spectroscopy.
  • Introduced deep-level transient spectroscopy (DLTS) for analyzing traps in semiconductors.
  • Applied the technique to GaAs to illustrate its effectiveness.
  • Included theoretical analysis of exponential capacitance transients.
  • DLTS effectively displays trap spectra as temperature-dependent peaks.
  • Peak height correlates with trap concentration; peak position reflects thermal emission properties.
  • Activation energy, concentration profile, and capture cross sections measured for various traps.

Abstract

A new technique, deep-level transient spectroscopy (DLTS), is introduced. This is a high-frequency capacitance transient thermal scanning method useful for observing a wide variety of traps in semiconductors. The technique is capable of displaying the spectrum of traps in a crystal as positive and negative peaks on a flat baseline as a function of temperature. It is sensitive, rapid, and easy to analyze. The sign of the peak indicates whether the trap is near the conduction or valence band, the height of the peak is proportional to the trap concentration, and the position, in temperature, of the peak is uniquely determined by the thermal emission properties of the trap. In addition, one can measure the activation energy, concentration profile, and electron- and hole-capture cross sections for each trap. The technique is presented with a simple theoretical analysis for the case of exponential capacitance transients. Various traps in GaAs are used as examples to illustrate certain features of the DLTS technique. Finally, a critical comparison is made with other recent capacitance techniques.

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Cite This Study

D. V. Lang (1974) studied this question.

synapsesocial.com/papers/69f81b7492d698c22ba62d73https://doi.org/10.1063/1.1663719
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