The hydrogen profiles of silicon-nitride films were measured using the p-p scattering technique with 1.2-MeV protons generated by a small accelerator. In plasma-nitride layers, hydrogen concentrations on the order of 20 at.% were found compared to 7 at.% in low-pressure CVD layers. The depth resolution was found to be 0.1 μm and a sensitivity limit of 10 ppm is estimated.
No takes yet. Share an insight, caveat, or question.
Paduschek et al. (1980) studied this question.
Synapse has enriched 5 related papers. Consider them for comparative context: