Chemical vapour deposition (CVD) is a promising process for the production of ferroelectric complex oxide films having a large electro-optical coefficient. We report the epitaxial growth of high-quality BaTiO 3 films using a single-source CVD process. A variety of epitaxial relationships have been achieved with BaTiO 3 films grown cube-on-cube on substrates of large lattice mismatched LaAlO 3 and MgO, and «001», «110» and «111» oriented SrTiO 3 . A large quadratic electro-optic coefficient was measured for CVD-prepared BaTiO 3 films. These films also have values of the optic refractive indices and second electro-optic susceptibilities close to those of bulk BaTiO 3 crystals, indicating their excellent quality.
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Zhao et al. (1997) studied this question.
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