Increased Surface Roughness in Polydimethylsiloxane Films by Physical and Chemical Methods

. In the chemical method, the increase in roughness was even greater (1000%). Wells were generated with surface areas that were close to 100 μm² and depths of up to 500 nm. The observations of AFM images and FTIR spectra were in agreement with the hypothesis of etching by Br radicals generated by UV on the polymer chains. Both methods induced important changes in the surface roughness (the chemical method generated the greatest changes due to the formation of surface wells), which are of great importance in superficial technological processes.