Correlation between Surface Chemistry, Density, and Band Gap in Nanocrystalline WO3 Thin Films

Nanocrystalline WO(3) thin films were produced by sputter-deposition by varying the ratio of argon to oxygen in the reactive gas mixture during deposition. The surface chemistry, physical characteristics, and optical properties of nanocrystalline WO(3) films were evaluated using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray reflectivity (XRR), and spectrophotometric measurements. The effect of ultramicrostructure was significant on the optical properties of WO(3) films. The XPS analyses indicate the formation of stoichiometric WO(3) with tungsten existing in fully oxidized valence state (W(6+)). However, WO(3) films grown at high oxygen concentration (>60%) in the sputtering gas mixture were over stoichiometric with excess oxygen. XRR simulations based on isotropic WO(3) film-SiO(2) interface-Si substrate modeling indicate that the density of WO(3) films is sensitive to the oxygen content in the sputtering gas. The spectral transmission of the films increased with increasing oxygen. The band gap of these films increases from 2.78 to 3.25 eV with increasing oxygen. A direct correlation between the film density and band gap in nanocrystalline WO(3) films is established on the basis of the observed results.