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Ensuring reliable and safe operation of high-power electronic devices necessitates the development of high-quality dielectric nano-capacitors with high recoverable energy density ( U Rec ) and efficiency ( η ) at low applied electric fields ( E )/voltages. In this work, we demonstrate ultra-high U Rec and η at low E < 500 kV/cm in as-grown epitaxial relaxor ferroelectric (RFE) PMN-33PT films, rivaling those typically achieved in state-of-the-art RFE and antiferroelectric (AFE) materials. The high energy storage properties were achieved using a synergistic strategy involving large polarization, a giant built-in potential/imprint (five times higher than the coercive field), and AFE like behavior. The structural, chemical, and electrical investigations revealed that these achievements mainly arise from the effects of strain, dipole defects, and chemical composition. For instance, at low E , the capacitors exhibit under 160 kV/cm ( i.e. , 8 V) and 400 kV/cm ( i.e. , 20 V), respectively, an ultra-high Δ P (45 μC/cm 2 and 60 μC/cm 2 ), U E = U Rec / E (21 J⸱MV/cm 2 and 17 J⸱MV/cm 2 ), and U F = U Rec /(1– η ) (20 J/cm 3 and 47 J/cm 3 ) with a robust charge-discharge fatigue endurance and outstanding frequency and thermal stability. Additionally, the designed films exhibit outstanding energy storage performance at higher E up to 2 MV/cm (Δ P ≈ 78 μC/cm 2 , U E ≈ 17.3 J⸱MV/cm 2 and U F ≈ 288 J/cm 3 ) due to their low leakage current density. • High-quality epitaxial PMN–33PT films with MgO and/or PbO excess grown by PLD on SRO/STO. • Induced antiferroelectric-like behavior due to the formation of dipole defect complexes. • Strain gradient near the interface and defect dipole alignment induced a giant imprint. • High energy storage at low voltages due to synergetic effects of the polarization, imprint, and AFE behavior. • Ultra-high U E = U Rec /E = 17 J MV/cm 2 and U F =U Rec /(1-η) = 47 J/cm 3 at E = 400 kV/cm (i.e., 20V).
Belhadi et al. (Sat,) studied this question.