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May 17, 2026Bulletin of the Russian Academy of Sciences Physics0 citations

Stoichiometric Sputtering of Tantalum Pentoxide by Helium Ions

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ВМВ.В. Манухин

Key Points

  • This research investigates how helium ion bombardment alters the surface composition of tantalum oxide.
  • Analysis of component composition and thickness of the surface layer after ion bombardment.
  • Utilization of calculations to determine altered layer properties in two-component targets.
  • Examination of changes in oxygen content of the surface layers.
  • Measured surface layers of tantalum oxide had reduced oxygen content compared to the original material.
  • Data aligned with experimental observations regarding surface changes.
  • Determined thickness of altered layer formed due to sputtering.

Abstract

The changes that occur on the surface of tantalum oxide bombarded by helium ions were analyzed by a method of calculating the component composition and thickness of the layer formed as a result of light-ion sputtering of two-component targets. Based on the data obtained, the thickness of the changed layer and its composition were determined. The results showed that the surface layers contain less oxygen than the original material, which agrees with experimental observations.

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Cite This Study

В.В. Манухин (2026) studied this question.

synapsesocial.com/papers/6a095ac47880e6d24efe0942https://doi.org/10.1134/s1062873826700012
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