The influence of group V:III flux ratio on the molecular beam epitaxy growth process of AlGaAs/GaAs quantum wells is studied by means of photoluminescence, using a careful line shape analysis. Upon enlarged group V flux, a sublinear increase of the growth rate and a reduction of shallow impurity incorporation is found, with, however, an increase of deep trap concentration, attributed to EL2.
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Köhrbrück et al. (1989) studied this question.