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February 3, 2023ElectronicsOpen Access

Investigation of Source/Drain Recess Engineering and Its Impacts on FinFET and GAA Nanosheet FET at 5 nm Node

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DWDawei WangXSXin SunTLTao Liu

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Wang et al. (2023) studied this question.

synapsesocial.com/papers/6a09731de5a55b25c05126a6https://doi.org/10.3390/electronics12030770
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