Study synthesized aluminum-graphene nanoplatelet composites, showing better structural resilience in microelectronics, suggesting enhanced reliability.
While aluminum (Al) continues to be a cornerstone for microelectronic interconnect technologies, its chronic tendency toward hillock growth and thermal instability necessitates a transition toward high-performance nanostructured material architectures. This research tackles these reliability bottlenecks by achieving a molecular-level integration of graphene nanoplatelets (GNPs) within Al matrices, a strategy designed to fortify structural resilience. Adopting a green chemistry approach, we synthesized Al-GNP (0.25 vol.%) composite thin films through Pulsed Laser Deposition (PLD) using precursors derived from recycled aluminum. A major obstacle—the formation of the deleterious Al4C3 intermetallic phase—was effectively suppressed by ensuring a homogeneous supramolecular dispersion via a specialized dual protocol (ultrasonication and magnetic stirring) during the powder metallurgy stage. Comprehensive physicochemical characterization, utilizing HR-TEM and XRD, verified the structural integrity of the multilayer GNPs (d-spacing = 4.6 Å). Furthermore, surface metrology analysis uncovered a radical shift in growth kinetics: whereas pure Al grew via a “spiky” Volmer-Weber mechanism (Sku = 31.17), the carbon-based inclusion stabilized the film evolution, tempering the kurtosis to Sku = 7.74. Analytical cross-sectional EDS confirmed both stoichiometric fidelity and the achievement of void-free Si/Pt/Al-GNP interfaces. These outcomes prove that a precise nanoscale tailoring of surface morphology via carbonaceous reinforcements significantly bolsters microstructural stamina. Consequently, these PLD-deposited composites emerge as sustainable, cutting-edge candidates for the next generation of microelectronic packaging and interfacial chemistry applications.
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Castañeda-Guzmán et al. (2026) studied this question.
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