Recent improvements to the Aerodyne Linear Microdensitometer have enabled the attainment of ensurational accuracies of 0.025-microns. This accuracy, coupled with optical resolution capabilities of 0.5 to 1.0-microns, permits computerized photomask inspection that allows submicron defect detection with outstanding mensurational accuracy. For photomask line widths on the order of 1-micron, mensurational accuracies of better than 5% of the line width are thus achieved.
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Burton D. Figler (1980) studied this question.