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The realization of precision deep microstructures requires high-energy, intense parallel beams of x-rays from synchrotron radiation sources and novel process technology. Deep x-ray lithography with synchrotron radiation is basically a shadow printing process in which a two-dimensional pattern is accurately transferred from a mask into a resist material by chemical changes induced by the radiation. Subsequent electroforming and moulding processes are used to manufacture microstructures from metals, plastics and ceramics. This process, known as LIGA (LIthographie, Galvanoformung, and Abformung), first developed in Germany, is based on a combination of lithography, electroforming and replication processes. The development of the LIGA process for the fabrication of a wide range of precision microstructures has been stimulated by the increasing use of synchrotron radiation sources for lithography.
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D.W.L. Tolfree (1998) studied this question.
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