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Single crystals of silver were cleaned by electron-and argon-ion bombardment under conditions of ultra-high vacuum. The work function of the (111) surface, measured photoelectrically, was (4.74 ± 0.02) eV. Oxygen adsorption caused an increase in the work function of about 0.4 eV. Unter Ultrahochvakuumbedingungen wurden Silber-Einkristalle mittels Elektronenund Argonionenbeschuß gesäubert. Die photo-elektrisch gemessene Austrittsarbeit der (lll)-Oberfläche betrug (4,74 ± 0,02) eV. Sauerstoffadsorption verursacht eine Zunahme der Austrittsarbeit von etwa 0,4 eV.
Dweydari et al. (Wed,) studied this question.