This article describes a moiré technique for determining distortions in soft lithography. We use the technique to investigate distortions when soft lithography is performed in a variety of configurations; a method is identified for limiting maximum distortions to less than 1 μm over areas ∼1 cm2. We also suggest an approach for actively controlling these distortions, and we demonstrate in a simple way its feasibility.
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Rogers et al. (1998) studied this question.
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