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May 19, 1975Physical Review Letters40 citations

Localization and the Minimum Metallic Conductivity in Si Inversion Layers

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DTD. C. TsuiSAS. J. Allen

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Abstract

We observe the "minimum metallic conductivity, " ₌, to be a decreasing function of surface-state charge density, Qₒₒ, near the Si-SiO₂ interface. This dependence of ₌ on Qₒₒ is contrary to Mott's concept of minimum metallic conductivity, but explains the large differences in ₌ reported in the recent literature.

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Cite This Study

Tsui et al. (1975) studied this question.

synapsesocial.com/papers/6a1baf05237e318913431126https://doi.org/10.1103/physrevlett.34.1293
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