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Abstract Dielectric capacitors used as energy storage components in electrical and electronic systems offer ultrafast charge and discharge rates but have long faced the challenge of insufficient recoverable energy storage density. These materials are either lead-based, and/or their processing involves hazardous chemicals and expensive equipment, which hampers their scalability and limits their industrial applicability. We report here thin films with enhanced energy density (61 J cm -3 ) and efficiency (70%) from chemical solution deposition that are lead-free, scalable, comparably cheap in production and equipment costs and possess properties comparable to those of other high energy density dielectrics produced by costly high-vacuum deposition methods. This lead-free high-performance dielectric demonstrates a step toward implementation of dielectric thin films produced through an affordable, industrially scalable process, achieving improved energy densities.
Kobald et al. (Thu,) studied this question.