Synthesis and thin‐film orientation of poly(styrene‐block‐trimethylsilylisoprene)

The successful synthesis, characterization, and directed self‐assembly of a silicon‐containing block copolymer, poly(styrene‐ block ‐trimethylsilylisoprene) (P(S‐ b ‐TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene‐ block ‐methyl methacrylate) is reported. A Sakurai, Grignard‐type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S‐ b ‐TMSI) was successfully ordered and oriented by directed self‐assembly.