Demonstrates compact diplexer performance in E-band applications, suggesting advancement in 6G technology.
This paper presents a fully integrated E-band (83/95 GHz) diplexer realized in STMicroelectronics’ BiCMOS 55 nm technology. The design directly addresses the critical trade-off between miniaturization and the performance required for high-frequency on-chip systems. The key innovation is a novel patch resonator optimally exploiting the multi-layer structure of the technology’s Back-End-Of-Line. It achieves significant compactness by jointly combining two distinct miniaturization techniques: slotted structures and mushroom-type capacitive loading. This method results in an impressive 77% size reduction compared to conventional designs. Furthermore, we introduce precisely controlled transmission zeros (TZs) to maximize inter-band isolation. The fabricated diplexer achieves a remarkably narrow fractional bandwidth (FBW) of 8.2%—the lowest reported to date for integrated BiCMOS/CMOS E-band implementations—and a robust inter-band isolation exceeding 25 dB, while demonstrating excellent return loss (better than 25 dB). Hence, this work validates a highly compact and scalable approach for integrated E-band transceivers, paving the way for future 6G front-end applications.
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Wehbi et al. (2026) studied this question.
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