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This study reports the fabrication and characterization of activated zinc oxide (ZnO) thin films via oxygen plasma treatment for application in d -glucose oxidation. ZnO thin films were synthesized using a co-precipitation method followed by spin coating, and subsequently exposed to oxygen plasma for 6 and 9 min. Their structural and optical properties were analyzed using X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDX), atomic force microscopy (AFM), ultraviolet-visible (UV–Vis) spectroscopy, attenuated total reflectance Fourier-transform infrared spectroscopy (ATR-FTIR), and photoluminescence (PL) spectroscopy. XRD analysis revealed a reduction in the average crystallite size from 16 nm to 12 nm after plasma treatment. SEM images showed clear surface morphological modifications, while AFM indicated an increase in surface roughness from 2.85 nm to 6.03 nm due to the incorporation of oxygen-containing functional groups. UV–Vis spectroscopy showed an increase in the optical band gap from 3.26 eV to 3.32 eV. Moreover, ATR–FTIR and PL results confirmed the enhanced glucose oxidation activity of the plasma-treated ZnO thin films. • ZnO thin films were fabricated and treated with oxygen plasma. • Plasma increased surface roughness via oxygen-containing groups. • Treated films showed improved glucose oxidation activity.
Amani et al. (Wed,) studied this question.