During vapor deposition growth of amorphous materials, we propose that adatom clusters align such as to minimize surface energy. This alignment, a thermally activated process, causes the as-grown structure of the amorphous thin film to be anisotropic and stabilizes the structure against subsequent relaxation, presumably by reducing free volume. A two-level-systems analysis describes the effect of deposition temperature, deposition rate, and subsequent annealing. The model is used to describe the growth-induced magnetic anisotropy of amorphous Tb-Fe.
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F. Hellman (1994) studied this question.
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