Removal of isopropyl alcohol (IPA) in a semiconductor facility using ozone catalytic oxidation

Isopropyl alcohol (IPA) is a widely used organic solvent in the semiconductor industry and is commonly detected as an indoor volatile organic compound (VOC) that poses potential risks to both manufacturing processes and human health. In this study, ozone catalytic oxidation (OZCO) was investigated as an effective technology for IPA removal through laboratory-scale experiments and real field tests conducted in a semiconductor manufacturing facility. The laboratory results demonstrated that IPA removal efficiency was strongly dependent on ozone dosage, achieving up to 97% removal at an ozone generator power of 80 W under ambient temperature conditions. Carbon balance analysis indicated effective oxidation of IPA, with the majority of carbon converted to CO2, confirming the strong oxidative capability of the OZCO process. Field-scale evaluations further demonstrated stable and effective removal of IPA and acetone, with removal efficiencies of 87-89% and 80-85%, respectively, over repeated tests under actual operating conditions. The results confirm the reliability and applicability of the OZCO system for continuous VOC control. Overall, this study highlights the potential of OZCO as a feasible and practical technology for VOC abatement in semiconductor manufacturing facilities.