Cell Micropatterning Method Using Indium-Tin-Oxide Patterned Microarray Chip

Cell micropatterning is an essential technology for elucidating intercellular crosstalk and the behavior of single cells and cell populations. However, conventional micropatterning methods based on chemically modified cell-adhesive and nonadhesive surfaces face significant challenges. These methods involve challenges in optimizing substrate surfaces for culturing different cell types and exhibit variations in patterning precision. In this study, we propose a novel cell micropatterning method using an indium-tin-oxide (ITO) patterned microarray chip in combination with ultraviolet C (UVC, 254 nm) irradiation. By exposing an ITO microarray chip with adhered cells to UVC light, U-87 cells on the ITO layer proliferated to form a cell layer. Simultaneously, contact between adjacent cell layers was prevented, resulting in the formation of independent U-87 cell layers with the same geometry as the ITO layer. This method allows structurally unrestricted cell culture on a flat surface and free coating of the culture surface with materials that are most suitable for cell culture and eliminates the need for additional processes such as temperature control or voltage application during patterning. Furthermore, because the process does not rely on cell-adhesive or nonadhesive chemical factors, which vary significantly among cell types, it is expected to provide consistent performance across diverse cell species. Therefore, the proposed method enables the construction of optimal, low-stress cell culture environments on a simple planar platform without requiring specialized microstructures or adhesion factors.