Gated integrating laser-combined scanning tunneling microscopy demonstrates surface photovoltage mapping in silicon, suggesting electronic structure insights.
A gated integrating laser-combined scanning tunneling microscope has been developed for high-fidelity investigation of photophysical processes at the atomic scale. This instrument integrates a low-repetition-rate, high-pulse-energy laser with a synchronized gated-integration scheme, enabling selective extraction of the laser-induced tunneling current. To demonstrate its performance, atomically resolved topography and surface photovoltage mapping were simultaneously obtained on the Si(111)-(7 × 7) surface. The surface photovoltage distribution is found to be strongly correlated with the underlying atomic structure. In addition, a highly localized enhancement of the laser-induced tunneling current is observed at a specific single-atom defect site. Detailed analysis, supported by local density of states measurements, reveals that this defect possesses an unusually high density of deep valence-band states. This distinctive electronic structure likely promotes Auger recombination between photogenerated holes accumulated under positive sample bias and electrons tunneling from the tip, thereby giving rise to the observed increase in the local tunneling current.
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Wang et al. (2026) studied this question.
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